EETimes bericht dat Intel een verbeterd 0,18micron CMOS proces heeft uitgedokterd, waarmee de Pentium III voorbij de 800MHz barrière getilt kan worden:
The "notched-poly" process refinement described by Tahir Ghani, senior engineer with Intel's logic technology development group (Portland, Ore.), has already been included in Intel's 0.18-micron CMOS process and in circuits manufactured with transistor gate lengths of 0.1 micron (100 nanometers). At a session after his presentation, Ghani said Intel had "made Pentium III devices but not shipped [them] yet." He later qualified that statement, saying, "Some devices have shipped, but we haven't announced that yet." Regardless, "The clock frequency is better than 800 MHz," Ghani said.
[...] Intel's 0.18-micron process technology normally produces transistors with a 0.13-micron gate length, but in his presentation Ghani said a method had been devised that allowed a notch to be introduced at the bottom of each transistor's polysilicon gate, thereby narrowing the gate length to 100 nm.
Another advantage of the notched-poly process is that it allows the continued use of 248-nm lithography, Ghani said.
Als proefkonijn voor deze nieuwe produktietechnologie misbruikte Intel een stel 16-Mbit SRAM chips, die met het notched-poly proces kloksnelheden van 1,16GHz bereikten.